summary
Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
description
Scope
1.1 This specification covers pure titanium sputtering targets used as a raw material in fabricating semiconductor electronic devices.
1.2 This standard sets purity grade levels, physical attributes, analytical methods, and packaging.
Details
Publisher
ASTM
File size
27.84 KB
Pages
3
Format
PDF
Publication date
2017-08-16
