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summary
Surface chemical analysis. Secondary-ion mass spectrometry. Determination of boron atomic concentration in silicon using uniformly doped materials. | Status: Revised, Withdrawn
Details
Publisher
BS
File size
641.21 KB
Pages
32
Format
PDF
Publication date
2000-04-15
ISBN-13
978-0-580-34674-3
ISBN-13 plain
9780580346743
ISBN-10
0580346749