What is ISO 22278 about?
ISO 22278 specifies the test method for measuring the crystalline quality of single-crystal thin film (wafer) using the XRD method with a parallel X-ray beam.
ISO 22278 applies to all of the single-crystal thin film (wafer) as bulk or epitaxial layer structure.
Who is ISO 22278 for?
ISO 22278 on crystalline quality of the single-crystal thin film is useful for: 
- Ceramic manufacturers
- Mechanical engineers
Why should you use ISO 22278?
Single crystals are important in many applications ranging from synthetic gemstones for jewellery to hosts for solid-state lasers. For some applications, ceramic materials are prepared as single crystals. When used as substrates for thin film growth such as gallium-on-sapphire technology or the growth of superconductor thin films, it is the crystalline perfection of a single crystal that is important.
The properties of these single-crystal thin-film materials have made them promising candidates for future high-power, high-frequency semiconductor devices.
While determining the crystalline quality of the single-crystal thin film (wafer), using the XRD method with parallel X-ray beam can easily create a great error margin, therefore ISO 22278 becomes necessary as it’s a standard on universal measurement methods and conditions. This will help your organization to reduce the margin of error thus increasing efficiency and quality.
