What is ISO 22415 about?
ISO 22415 specifies a method for measuring and reporting argon cluster sputtering yield volumes of a specific organic material.
The method requires one or more test samples of the specified material as a thin, uniform film of known thickness between 50 and 1000 nanometres on a flat substrate that has a different chemical composition to the specified material.
ISO 22415 is applicable to test samples in which the specified material layer has a homogeneous composition in-depth and is not applicable if the depth distribution of compounds in the specified material is inhomogeneous. ISO 22415 is applicable to instruments in which the sputtering ion beam irradiates the sample using a raster to ensure a constant ion dose over the analysis area.
Who is ISO 22415 for?
ISO 22415 on surface chemical analysis applies to:
- Organic material manufacturers
- Chemical laboratories
Why should you use ISO 22415?
ISO 22415 provides a chemical testing method that is vital for regulatory compliance and to understand the quality and composition of chemical substances and materials that are used in products, industrial processes and manufacturing.
ISO 22415 provides measures for the distribution of chemical components in the near-surface region of materials is essential to understanding and optimising their performance and manufacture.
