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summary
Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth calibration for silicon using multiple delta-layer reference materials. | Status: Confirmed, Current
description
1 Scope
1.1 This International Standard specifies a procedure for calibrating the depth scale in a shallow region, less than 50 nm deep, in SIMS depth profiling of silicon, using multiple delta-layer reference materials.
Details
Publisher
BS
File size
1007.91 KB
Pages
30
Format
PDF
Publication date
2009-05-31
ISBN-13
978-0-580-55765-1
ISBN-13 plain
9780580557651
ISBN-10
0580557651