What is ISO/TR 15969 about?
ISO/TR 15969 specifies guidelines for measuring the sputtered depth in sputtered depth profiling which are applicable to techniques of surface chemical analysis. The depth typically determined by this approach is between 1 nm to 500 μm.
ISO/TR 15969 specifies determination of depth scale in sputtered depth profiling where signal intensity is obtained as a function of sputtering time.
Who is ISO/TR 15969 for?
ISO/TR 15969 on surface chemical analysis is relevant to:
- Chemical engineers
- Aerospace industry
- Semiconductor industry
Why should you use ISO/TR 15969?
Depth profiling is a process where the element or chemical content of a sample is measured as a function of depth. Sputter depth profiling is a direct method to obtain the in-depth distribution of composition in thin films, at surfaces and at interfaces.
Guidelines under ISO/TR 15969 help you in measuring the sputtered depth in sputtered depth profiling which helps in:
- Determination of the depth scale in sputter depth profiling where signal intensity is obtained as a function of sputtering time
- Enhancing the comparability of depth profiling data obtained with different instruments and to increase the reliability and use of depth profiling in industrial applications
Overall, ISO/TR 15969 can serve as the basis for the development of International Standards on the measurement of sputtered depth.
What’s changed since the last update?
PD ISO/TR 15969:2021 supersedes DD ISO/TR 15969:2001 which is withdrawn. The main changes are:
- Clarity in the applicable range of depth specified in scope
- Clause 3 has been revised according to the latest edition of the ISO 18115 series
